• First prebake the wafer (10 minutes at 80 degrees C) to remove water.
• Line spinner with Aluminum foil. If the process is very sensitive and you don't want any splashback you can skip the foil, but spray it down with acetone afterwards.
• Choose a chuck and piece of rubber (to help with vacuum). If chuck has photoresist on it, clean with acetone. Note that anything with photoresist on it must be put in a plastic zip-lock bag and disposed of in the yellow hazardous waste bin.
• Place chuck on spinner, aligning the set screw with the flat, and finger tighten. Place rubber on top.
• Two switches on: Vacuum pump and Power switch. Test vacuum with finger, using the footpedal to turn on the vacuum and spin. It won't spin unless there is a vacuum.
• Center the wafer on the spinner. This will probably take several tries.
• The first thing you spin on is HMDS (adhesive promoter). There is a small dropper bottle you can use (I think it says Tom Carver on it). Apply generously, then spin at 3000 rpm for 40 seconds. You can use the timer for automatic shutoff.
• Now spin on the photoresist. We should buy our own dropper bottle and put some in there from the larger containers. Apply very generously, then spin at 3000 rpm for 40 seconds. This is for 1813 photoresist, see the charts at the bench for thickness vs. spin speed data.
• If you don't apply enough photoresist, you get pie slices of uncovered wafer around the edges. You can spin on more, or rinse with acetone over sink, singe bake, and start over again.
• Clean up: Turn off the power swtiches, remove the Al foil.
• Postbake for 20 minutes at 90 degrees C in the oven or for 5 minutes at 90 degres C on the hotplate.

Using the Kasper Mark Aligner

• Turn on power switch for the lamp, which is underneath the table on the right side. Press the pulse starter button. You should see a light at the back of the machine.
• Wait 10-30 minutes for warm up.
• Turn on power strip on the floor. Hit the power switch on the machine. You should see a light to the right of the eyepieces.
• Hit the MASK LOAD button. This automatically raises the eyepieces and then you can open the wafer and mask assembly.
• Center the wafer table. The knob on the left of the table rotates the wafer (only about +/- 5 degrees). Place the wafer on the table, in the center of the circles, with the flat towards you.
• The left mouse thing, with the small button pressed, moves the entire stage.
• The right mouse thing, with the small button pressed, moves just the wafer table. If you don't press the button, it moves less.
• Place the mask inside the lid. You want the chrome side facing towards you. You want that side closest to the wafer in order to get sharp features. To figure out which side is chrome, look at it from an angle where you can see a shadow of the chrome on the other side.
• Close the lid. Once you close it about halfway, the vacuum will enagage to hold the mask into place. Make sure it is seated well.
• Hit the MASK LOAD button again. The eyepieces will lower.
• Hit the LOADED MANUAL button. The wafer hits the mask then it separates.
• Hit the VISUAL ALIGN button. The eypieces will open again and you can check the alignment without them. Hit the VISUAL ALIGN button again to close.
• Rotate selector below the eyepieces to the ROW & COLUMN MICROSCOPE mode. Do fine alignment.
• Once it is lined up, set timer on right for 45 seconds (which reads 450).
• Rotate the selector to EXPOSE.
• Hit the CONT. (contact) button on the left.
• Hit the MANUAL EXPOSE button. It takes a couple seconds before the UV light goes on. Don't stare at the UV light. Turns off automatically using the timer.
• Hit the MASK LOAD button to open.
• Lift lid carefully, don't let the mask fall off after the vacuum stops.
• To get the wafer off, hit the EJECT button, or gently lift off the vacuum using tweezers. You can also use EJECT when you want to lower the wafer after you have already done LOADED MANUAL.
• To shutdown, turn off the power to the lamp under the table and turn off power strip on floor.
• Fill out the log book.

• Mix up the developer. Use the Microposit Developer concentrate and mix 1:1 with water from the DI gooseneck. Use about 40 mL of each and place in the tall petri dish thing.
• For 1813 photoresist, develop for 45 seconds. Use the timer on the bench. While developing, swirl around and agitate; keep the developer moving. Keep a grip on the wafer with the tweezers for quick removal.
• Drip off in sink, then rinse with DI water from the gooseneck.
• Put in airknife to dry, can also use the Nitrogen gun.
• The leftover developer goes down the drain and you clean the glassware with DI water.