Exposure

• Clip transparency face down to resist coated side of chrome mask
• Set-up Kaspar aligner
• Turn on at power strip and pwr rocker switch, toggle the "ST" rocker switch
• Check that light is on
• Press "mask load" to open Kaspar, lift plate and place mask transparency side up
• Center mask under 3" hole in plate
• Press "mask load" to close
• Remove backplate to access manual shutter switch, closest of 3 toggle switches manually opens and closes the UV shutter
• Set timer for exposure and open/close shutter using toggle switch
• 60 seconds reasonable exposure, 75 seconds for fine features

Develop

• equal parts micro-deposit developer concentrate and DI water
• Developer should be replenished when it starts to yellow
• Used developer is poured down the sink drain and flushed with plenty of water
• Develop time should be about 60 sec, swirl gently
• Handle with tweezers—choke up on tweezers—and rinse well with DI water
• Dry with nitrogen gun before inspecting under microscope
• Hard bake the mask in 120° C oven for 15-20 minutes

Chrome Etch (bright orange, under counter)

• Use big crystallization dish with 3 standoffs for chrome etch
• Use big dish of DI water to soak etchant off--roughly 10 minutes
• Use chrome etchant sparingly, wear neoprene gloves and face mask
• Pour puddle onto wafer surface, swirl to cover, let sit for few minutes
• Repeat if a lot of chrome needs to be removed
• Dispose of used etch into its waste bottle with funnel
• Wash all glassware well with DI water and dry—check towels for orange

Plegmatron plasma etcher

• Always kept under vacuum when not in use, hold "manual" and push "vent" to clear
• To clear photoresist left in patern use Process 5-- oxygen plasma de-scum cycle, hold "process" and push "5"
• Set time—hold "set" and "timer" until numbers flash
• Enter time—e.g. ½ minute is 5, 0, enter, 5 minutes is 5, 0, 0, enter
• Push "Run"
• Record actual flow, power, pressure, e.g. press "read" and "flow"
• To burn off hardbaked photresist, run O₂ de-scum for 5 minutes
• To open up an underexposed mask, use for 0.5 minute cycle
• When finished, restore vacuum by pressing "manual" and "rough"